Overview
The Royce Physical Vapour Deposition and Characterisation Facility is a state-of-the-art facility for thin-film deposition and device fabrication. All equipment is shared and owned by the Department of Materials Science & Metallurgy and supported by expert Technical Staff associated with several groups across the Department including the DMG, CMP, WEMs and 2D Materials & Devices.
For more information click here or here to Book a CMP Royce Facility
For funding opportunities, please refer to the Henry Royce Institute website.
Current Price List
Equipment
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AJA Sputtering system
Highly versatile RF and DC magnetron sputtering system, very good for superconducting films such as Nb
- Automated control of the sputtering process
- Ultra-high vacuum system with a base pressure better than 10−8 mbar
- Up to 11 target materials in one deposition
- Substrate size up to 100 mm diameter
- Substrate heater up to 850°C
- In-situ RF plasma pre-cleaning for substrates
- Quartz crystal thickness monitor
- Load lock allows for high throughput of samples
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Custom sputtering systems
The facility hosts 4 custom built DC magnetron sputtering systems
- Ultra-high vacuum systems up to 10−8 mbar
- Up to 4 different target materials
- Turntable with automated thickness control allows growth of multiple different samples in one deposition
- Sample heaters up to 1100°C is possible
- Reactive sputtering of nitrides and condutvie oxides is possible
- Highly customisable systems
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Electron beam evaporator
- Can grow high purity polycrystalline metallic films such as Au, Nb, Pt, V, Al, and Cu
- Up to 5 targets in one deposition
- Can grow at room temperature or liquid nitrogen temperature
- Can achieve a vacuum level of 10−8 mbar
- Quartz crystal thickness monitor
- Load lock allows for high sample throughput
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Argon ion miller
The argon ion miller allows for anisotropic and non-selective etching of devices.
Suitable for metallic or insulating materials.
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Atomic force microscope
A Bruker Multimode 8 with Nanoscope 5 controller.
Has several different modes of operation.
- Contact, tapping and peak force modes
- Standard atomic force microscopy (AFM)
- Magnetic force microscopy (MFM)
- Piezoelectric force microscopy (PFM)
- Kelvin probe force microscopy (KPFM)
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Electron-beam lithography system
LEO /ZEISS 1455VP scanning electron microscope equipped with Raith Elphy Quantum for device fabrication.
- Accelerating voltages from 200 V to 30 kV
- Single writefield up to 1000 μm
- 250 nm feature resolution exposed using a 400 μm writefield
- PC-based pattern generator allow up to 63 different layers
- Allows fully automated or user assisted field to field alignment
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Cryogenic DC/RF Probe station
Lake Shore Cryogenics CRX-6.5K
- Base temperature 8 K (2-probes) - 350 K
- Maximum 6-probes (DC/RF)
- Maximum sample size 51 mm (2")
- Vacuum <5x10^-4 Torr
- Visual System: 2.8 microns resolution
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