Overview
For deposition capabilities please watch our short video:
VIDEO
The Royce Physical Vapour Deposition and Characterisation Facility is a state-of-the-art facility for thin-film deposition and device fabrication. All equipment is shared and owned by the Department of Materials Science & Metallurgy and supported by expert Technical Staff associated with several groups across the Department including the DMG, CMP, WEMs and 2D Materials & Devices.
For more information click here or here to Book a CMP Royce Facility
For funding opportunities, please refer to the Henry Royce Institute website.
Current Price List
Equipment
AJA Sputtering system
Highly versatile RF and DC magnetron sputtering system, very good for superconducting films such as Nb
Automated control of the sputtering process
Ultra-high vacuum system with a base pressure better than 10−8 mbar
Up to 11 target materials in one deposition
Substrate size up to 100 mm diameter
Substrate heater up to 850°C
In-situ RF plasma pre-cleaning for substrates
Quartz crystal thickness monitor
Load lock allows for high throughput of samples
Custom sputtering systems
The facility hosts 4 custom built DC magnetron sputtering systems
Ultra-high vacuum systems up to 10−8 mbar
Up to 4 different target materials
Turntable with automated thickness control allows growth of multiple different samples in one deposition
Sample heaters up to 1100°C is possible
Reactive sputtering of nitrides and conductive oxides is possible
Highly customisable systems
Electron beam evaporator
Can grow high purity polycrystalline metallic films such as Au, Nb, Pt, V, Al, and Cu
Up to 7 targets in one deposition
Can grow at room temperature or liquid nitrogen temperature
Can achieve a vacuum level of 10−8 mbar
Quartz crystal thickness monitor
Load lock allows for high sample throughput
Argon ion miller
The argon ion miller allows for anisotropic and non-selective etching of devices.
Suitable for metallic or insulating materials.
Atomic force microscope
A Bruker Multimode 8 with Nanoscope 5 controller.
Has several different modes of operation.
Contact, tapping and peak force modes
Standard atomic force microscopy (AFM)
Magnetic force microscopy (MFM)
Piezoelectric force microscopy (PFM)
Kelvin probe force microscopy (KPFM)
Electron-beam lithography system
LEO /ZEISS 1455VP scanning electron microscope equipped with Raith Elphy Quantum for device fabrication.
Accelerating voltages from 200 V to 30 kV
Single writefield up to 1000 μm
250 nm feature resolution exposed using a 400 μm writefield
PC-based pattern generator allow up to 63 different layers
Allows fully automated or user assisted field to field alignment
Cryogenic DC/RF Probe station
Lake Shore Cryogenics CRX-6.5K
Base temperature 12 K (2-probes) - 350 K
Maximum 5-probes (DC/RF)
Maximum sample size 51 mm (2")
Vacuum <5x10^-4 Torr
Visual System: 2.8 microns resolution